Imec has demonstrated the capability of directed self-assembly (DSA) to pattern line/spaces with a pitch as small as 18nm, using a high-chi block copolymer (high-χ BCP) based process under high volume ...
For the iCVD topcoat, divinylbenzene (DVB) was selected as the monomer for its ability to form robust organic networks of exceptionally low roughness 30. The iCVD ...
There are still some problems to work out, such as cutting defect rates, but directed self-assembly has the potential to reduce the total number of masks. The upcoming 7nm process node presents tough ...
Through microphase separation, block copolymers (BCPs) can self-assemble into highly uniform, chemically distinct, periodic domains with dimensions and periods at scales of 3–200 nm 1,2 that are ...
(Nanowerk News) Imec and Tokyo Electron (TEL) announce that they will accelerate their Directed Self-Assembly (DSA) activities at imec’s recent 300 mm fab-compatible DSA process line. Over the past ...
At last year’s SPIE Advanced Lithography conference, Christopher Bencher, a member of the technical staff at Applied Materials, said the buzz surrounding directed self-assembly (DSA) technology ...
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