The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.
SAN JOSE, Calif. — Immersion lithography could be late to the market, forcing chip makers to consider 193-nm “dry” and double-exposure techniques for chip production at the 45-nm node and beyond, ...
TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...
David Abercrombie Many aspects of how double patterning (DP) affects the designer depend on the methodology used and the level of control the designer wants. One extreme in methodology and control is ...
Several fab tool vendors are rolling out the next wave of self-aligned patterning technologies amid the shift toward new devices at 10/7nm and beyond. Applied Materials, Lam Research and TEL are ...
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