High‑NA EUV's reduced field size is driving new innovation in optical proximity correction and mask synthesis.

Mililani resident Aki Shin, 37, took a voluntary furlough from Hawaiian Airlines earlier this month and has been spending some of her time sewing fabric face masks for her ohana and friends. Shin ...

Through microphase separation, block copolymers (BCPs) can self-assemble into highly uniform, chemically distinct, periodic domains with dimensions and periods at scales of 3–200 nm 1,2 that are ...