In reactive sputtering process with an Ar + O₂ gas mixture, the plasma emission observed near the cathode changes in appearance. When the oxygen content is high, the plasma exhibits a reddish-violet ...

Reactive sputtering process employs the combination of a non inert gas, such as oxygen, and an elemental target material, such as silicon. This gas chemically reacts with the sputtered atoms within ...

Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...

With the advancing of material science, nowadays the thin film deposition technology is developing quickly and has a crucial role in our everyday lives. Thin film deposition is the act of applying a ...

Alfa Chemistry has recently introduced a wide range of sputtering target materials designed specifically for the semiconductor industry. These targets come in various purities and sizes to cater to ...