Sputtering Explained | Thin Film Deposition Using Plasma in Nanotechnology
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Sputtering Explained | Thin Film Deposition Using Plasma in Nanotechnology
In this video, Prof. Ashutosh Tiwari explains the principle of sputtering, a key physical vapor deposition (PVD) method used to create thin films and coatings. In sputtering, a plasma of energetic ions bombards a solid target, ejecting atoms that deposit onto a substrate to form a thin film. Learn about the different sputtering modes — DC ...
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